Chip arrangement and a method for forming a chip arrangement

ABSTRACT

A chip arrangement is provided. The chip arrangement includes: a first chip electrically connected to the first chip carrier top side; a second chip electrically connected to the second chip carrier top side; and electrically insulating material configured to at least partially surround the first chip carrier and the second chip carrier; at least one electrical interconnect configured to electrically contact the first chip to the second chip through the electrically insulating material; one or more first electrically conductive portions formed over and electrically contacted to at least one of the first chip carrier top side and second chip carrier top side, and one or more second electrically conductive portions formed over and electrically contacted to at least one of the first chip carrier bottom side and second chip carrier bottom side.

TECHNICAL FIELD

Various embodiments relate generally to a chip arrangement and a methodfor forming a chip arrangement.

BACKGROUND

Many challenges are associated with device packages for multiple chips.Usually, a multi-chip package may be pieced together by severalsingle-chip packages. A typical example is an integrated circuit ICcontrolled half-bridge switch consisting of two power semiconductors andone driver IC. Each semiconductor chip may be packaged using standardpackaging technologies, and assembled with core processes, e.g. dieattaching, wire bonding & molding. The single-chip packages may finallybe electrically interconnected on a PCB. Poor electrically and thermaldevice performances are obtained as a result of restrictions to the useof standard interconnect technologies, such as wire-bonding.Furthermore, the manufacturing may be inefficient and costly, asmanufacturing may be usually carried out in serial processes.

SUMMARY

Various embodiments provide a chip arrangement including: a first chipcarrier including a first chip carrier top side and a first chip carrierbottom side; a second chip carrier including a second chip carrier topside and a second chip carrier bottom side; a first chip electricallyconnected to the first chip carrier top side; a second chip electricallyconnected to the second chip carrier top side; an electricallyinsulating material configured to at least partially surround the firstchip carrier and the second chip carrier; at least one electricalinterconnect configured to electrically contact the first chip to thesecond chip through the electrically insulating material; and one ormore first electrically conductive portions and one or more secondelectrically conductive portions formed over the electrically insulatingmaterial, wherein the one or more first electrically conductive portionsare formed over and electrically contacted to at least one of the firstchip carrier top side and second chip carrier top side, and wherein theone or more second electrically conductive portions are formed over andelectrically contacted to at least one of the first chip carrier bottomside and second chip carrier bottom side.

BRIEF DESCRIPTION OF THE DRAWINGS

In the drawings, like reference characters generally refer to the sameparts throughout the different views. The drawings are not necessarilyto scale, emphasis instead generally being placed upon illustrating theprinciples of the invention. In the following description, variousembodiments of the invention are described with reference to thefollowing drawings, in which:

FIG. 1 shows a chip arrangement according to an embodiment;

FIG. 2 shows a method for forming a chip arrangement according to anembodiment;

FIGS. 3A to 3I show a method for forming a chip arrangement according toan embodiment;

FIGS. 4A to 4C show a method for forming a chip arrangement according toan embodiment;

FIG. 5 shows a chip arrangement according to an embodiment.

DESCRIPTION

The following detailed description refers to the accompanying drawingsthat show, by way of illustration, specific details and embodiments inwhich the invention may be practiced.

The word “exemplary” is used herein to mean “serving as an example,instance, or illustration”. Any embodiment or design described herein as“exemplary” is not necessarily to be construed as preferred oradvantageous over other embodiments or designs.

The word “over” used with regards to a deposited material formed “over”a side or surface, may be used herein to mean that the depositedmaterial may be formed “directly on”, e.g. in direct contact with, theimplied side or surface. The word “over” used with regards to adeposited material formed “over” a side or surface, may be used hereinto mean that the deposited material may be formed “indirectly on” theimplied side or surface with one or more additional layers beingarranged between the implied side or surface and the deposited material.

Various embodiments provide a multi-chip laminated package wherein adevice may be laminated, and wherein redistribution layers may beprovided on one or more sides of the device.

Various embodiments provide a multi-chip device package, encapsulatedwith one or more same or different laminated foils.

Various embodiments provide a chip arrangement, including a metalcarrier, e.g. a carrier including copper, attached to a device backside, one or more metal vias, e.g. Cu vias, as device interconnects, andat least two redistribution layers,

Various embodiments provide a method for providing different processessuch as foil lamination for encapsulation and via production for thedevice interconnects to the periphery, wherein the processes may beconducted in parallel for package assembly.

FIG. 1 shows chip arrangement 102 according to an embodiment. Chiparrangement 102 may include first chip carrier 104, wherein first chipcarrier 104 may include first chip carrier top side 106 and first chipcarrier bottom side 108. Chip arrangement 102 may include second chipcarrier 112, wherein second chip carrier 112 may include second chipcarrier top side 114 and second chip carrier bottom side 116. Chiparrangement 102 may include first chip 118, e.g. a semiconductor chip,e.g. a semiconductor die, electrically connected to first chip carriertop side 106, and second chip 122 electrically connected to second chipcarrier top side 114. Chip arrangement 102 may include electricallyinsulating material 124 configured to at least partially surround firstchip carrier 104 and second chip carrier 106. Chip arrangement 102 mayinclude at least one electrical interconnect 126 configured toelectrically contact first chip 118 to second chip 122 throughelectrically insulating material 124. Chip arrangement 102 may includeone or more first electrically conductive portions 128 and one or moresecond electrically conductive portions 132 formed over electricallyinsulating material 124, wherein one or more first electricallyconductive portions 128 may be formed over and electrically contacted toat least one of first chip carrier top side 106 and second chip carriertop side 114, and wherein one or more second electrically conductiveportions 132 may be formed over and electrically contacted to at leastone of first chip carrier bottom side 108 and second chip carrier bottomside 116.

FIG. 2 shows method 200 for forming a chip arrangement according to anembodiment. Method 200 may include:

electrically connecting first chip to first chip carrier top side,wherein first chip carrier includes first chip carrier top side andfirst chip carrier bottom side (in 210);

electrically connecting second chip to second chip carrier top side,wherein second chip carrier includes second chip carrier top side andsecond chip carrier bottom side (in 220);

at least partially surrounding first chip carrier and second chipcarrier with an electrically insulating material (in 230);

forming at least one electrical interconnect to electrically contactfirst chip to second chip through electrically insulating material(240);

forming one or more first electrically conductive portions and one ormore second electrically conductive portions over electricallyinsulating material, wherein forming one or more first electricallyconductive portions and one or more second electrically conductiveportions over electrically insulating material includes forming one ormore first electrically conductive portions over and electricallycontacting one or more first electrically conductive portions to atleast one of first chip carrier top side and second chip carrier topside, and forming one or more second electrically conductive portionsover and electrically contacting one or more first electricallyconductive portions to at least one of first chip carrier bottom sideand second chip carrier bottom side (in 250).

FIGS. 3A to 3I show method 300 for forming a chip arrangement accordingto an embodiment.

FIG. 3A shows a plurality of structured carriers, e.g. lead frames.First chip carrier 104 may include first chip carrier top side 106 andfirst chip carrier bottom side 108, wherein first chip carrier top side106 may face a direction opposite to the direction which first chipcarrier bottom side 108 faces. For example, first chip carrier 104 maybe arranged, wherein first chip carrier top side 106 may face direction334, which faces a direction opposite to direction 336 which first chipcarrier bottom side 108 faces.

Second chip carrier 112 may include second chip carrier top side 114 andsecond chip carrier bottom side 116, wherein second chip carrier topside 114 may face a direction opposite to the direction which secondchip carrier bottom side 116 faces. For example, second chip carrier 112may be arranged, wherein second chip carrier top side 114 may facedirection 334, which faces a direction opposite to direction 336 whichsecond chip carrier bottom side 116 faces.

In 310, first chip carrier 104 and second chip carrier 112 may bearranged adjacent to each other (however, except of a common temporarysubstrate onto which they are arranged, and which they may temporarilyshare, they are mechanically decoupled from each other; in other words,first chip carrier 104 and second chip carrier 112 may be arrangedadjacent to each other, independently and separated from each other,onto a common carrier, e.g. common substrate). First chip carrier 104and second chip carrier 112 may be arranged adjacent to each other, butseparated by separation distance d_(s). Separation distance d_(s) mayrange from about 10 μm to about 10 mm, e.g. from about 50 μm to about 2mm, e.g. from about 100 μm to about 500 mm. First chip carrier 104 andsecond chip carrier 112 may be arranged, but are not limited to beingarranged, wherein first chip carrier top side 106 and second chipcarrier top side 114 may face the same direction and wherein first chipcarrier bottom side 108 and second chip carrier bottom side 116 may facethe same direction. First chip carrier 104 and second chip carrier 112may be arranged, but are not limited to being arranged, wherein firstchip carrier top side 106 and second chip carrier top side 114 may liesubstantially level to each other.

First chip carrier 104 may include first chip carrier lateral sides 338,342, wherein first chip carrier lateral sides lateral sides 338, 342 maybe arranged between first chip carrier top side 106 and first chipcarrier bottom side 108. For example, first chip carrier lateral sides338, 342 may connect first chip carrier top side 106 to first chipcarrier bottom side 108, wherein first chip carrier lateral side 338 mayface a direction opposite to a direction which first chip carrierlateral side 342 faces.

Second chip carrier 112 may include second chip carrier lateral sides344, 346, wherein second chip carrier lateral sides 344, 346 may bearranged between second chip carrier top side 114 and second chipcarrier bottom side 116. For example, second chip carrier lateral sides344, 346, may connect second chip carrier top side 114 to second chipcarrier bottom side 116, wherein second chip carrier lateral side 344may face a direction opposite to a direction which second chip carrierlateral side 346 faces.

First chip carrier 104 and second chip carrier 112 may be arranged, butare not limited to being arranged, adjacent to each other, wherein firstchip carrier lateral side 342 may be adjacent to second chip carrierlateral side 344. For example, first chip carrier 104 and second chipcarrier 112 may be arranged adjacent to each other, but may lie ondifferent vertical and/or horizontal planes from each other, as long asthey are mechanically decoupled from each other.

First chip carrier 104 may include a first lead frame carrier, e.g. alead frame. Second chip carrier 112 may include a second lead framecarrier, e.g. lead frame.

At least one of first chip carrier 104 and second chip carrier 112 mayinclude a structure metal foil and/or carrier material.

At least one of first chip carrier 104 and second chip carrier 112 mayinclude at least one from the following group of materials, the group ofmaterials consisting of: copper, nickel, iron, copper alloy, nickelalloy, iron alloy.

At least one of first chip carrier 104 and second chip carrier 112 mayhave a top side to bottom side thickness t_(C) thicker than 50 μm. Atleast one of first chip carrier 104 and second chip carrier 112 may havea top side to bottom side thickness t_(C) thicker than 75 μm.

At least one of first chip carrier 104 and second chip carrier 112 mayhave a top side to bottom side thickness t_(C) ranging from about 200 μmto about 300 μm, e.g. from about 220 μm to about 280 μm, e.g. from 240μm to about 260 μm.

At least one of first chip carrier 104 and second chip carrier 112 maybe configured as a heat dissipater.

FIG. 3B shows one or more die attach processes. In 320, method 300 mayinclude, electrically connecting first chip 118 to first chip carriertop side 106, wherein first chip carrier 104 may include first chipcarrier top side 106 and first chip carrier bottom side 108. Method 300may further include electrically connecting second chip 122 to secondchip carrier top side 114, wherein second chip carrier 112 may includesecond chip carrier top side 114 and second chip carrier bottom side116. At least one of first chip 118 and second chip 122 may have athickness (between top to bottom) ranging from about 5 μm to about 500μm, e.g. from about 10 μm to about 250 μm e.g. from about 20 μm to about100 μm. At least one of first chip 118 and second chip 122 may have asize, e.g. a surface area, ranging from about 50 mm² to about 0.1 mm²,e.g. from about 20 mm² to about 0.25 mm², e.g. from about 10 mm² toabout 0.5 mm²

First chip 118 and second chip 122 may each include a powersemiconductor chip, wherein the power semiconductor chip may include atleast one power semiconductor device from the group consisting of: apower transistor, a power MOS transistor, a power bipolar transistor, apower field effect transistor, a power insulated gate bipolartransistor, a thyristor, a MOS controlled thyristors, a siliconcontrolled rectifier, a power schottky diode, a silicon carbide diode, agallium nitride device. For example, first chip 118 and second chip 122may include a power transistor.

First chip 118 and second chip 122 may each include a powersemiconductor device, wherein the power semiconductor device may becapable of carrying a voltage of up to approximately 600 V.

First chip 118 may include top side 348 and bottom side 352, wherein topside 348 may face a direction opposite to the direction which bottomside 352 faces.

First chip 118 may include a gate region contact 354 and at least onefirst source/drain region contact 356 formed over, e.g. directly on orindirectly on, top side 348, and at least one second source/drain regioncontact 357 formed over bottom side 352. Each of the contacts 354, 356may include an electrically conductive contact pad. Each electricallyconductive contact pad including at least one material, element or alloyfrom the following group of materials, the group consisting of: copper,aluminum, silver, tin, gold, palladium, zinc, nickel. Each of thecontacts 354, 356 may be electrically isolated from each other over topside 348 of first chip 118. For example, gate region contact 354 may beelectrically isolated from at least one first source/drain regioncontact 356 by an electrically insulating material, e.g. silicon dioxideor polyimide or nitride, formed over top side 348. Electricallyinsulating material 124 described hereinafter, may also be used toelectrically isolate gate region contact 354 from at least one firstsource/drain region contact 356.

Top side may also be referred to as a “first side”, “front side” or“upper side” of the chip. The terms “top side”, “first side”, “frontside” or “upper side” may be used interchangeably hereinafter. Bottomside may also be referred to as “second side” or “back side” of thechip. The terms “second side”, “back side”, or “bottom side” may be usedinterchangeably hereinafter.

As used herein with respect to semiconductor power devices, the terms“top side”, “first side”, “front side” or “upper side” may be understoodto refer to the side of the chip wherein a gate region and at least onefirst source/drain region may be formed. The terms “second side”, “backside”, or “bottom side” may be understood to refer to the side of thechip wherein a second source/drain region may be formed. Therefore, asemiconductor power transistor may support a vertical current flowthrough the chip between a first source/drain region over top side 348and a second source/drain region over bottom side 352.

Second chip 122 may include a semiconductor power transistor includingtop side 358 and bottom side 362. Similarly, second chip 122 may includegate region contact 364 and at least one first source/drain regioncontact 366 formed over top side 358, and at least one secondsource/drain region contact 368 formed over bottom side 362. Gate regioncontact 364 may be electrically isolated from at least one firstsource/drain region contact 366 by an electrically insulating material,e.g. silicon dioxide or polyimide or nitride, formed over top side 358.Electrically insulating material 124 described hereinafter, may also beused to electrically isolate gate region contact 364 from at least onefirst source/drain region contact 366.

First chip 118 may be disposed over first chip carrier 104, and firstchip 118 may be electrically connected to first chip carrier 104 via atleast one contact pad, e.g. second source/drain region contact 357formed over first chip back side 352.

Similarly, second chip 122 may be disposed over second chip carrier 112,and second chip 122 may be electrically connected to second chip carrier112 via at least one contact pad, e.g. second source/drain regioncontact 368 formed over second chip back side 362. Each electricallyconductive contact pad may include at least one material, element oralloy from the following group of materials, the group consisting of:copper, aluminum, silver, tin, gold, zinc, nickel.

First chip 118 may be electrically connected to first chip carrier 104via an electrically conductive medium 372. Second chip 122 may beelectrically connected to second chip carrier 112 via an electricallyconductive medium 374. First chip 118 may be electrically connected tofirst chip carrier 104 and second chip 122 may be electrically connectedto second chip carrier 112 in a parallel process, wherein both chips118, 122 may be adhered to the respective chip carriers 104, 112 in thesame process.

Electrically conductive medium 372 and electrically conductive medium374 may each include at least one from the following group of materials,the group consisting of: a solder, a soft solder, a diffusion solder, apaste, a nanopaste, an adhesive, an electrically conductive adhesive, athermally conductive adhesive. Electrically conductive medium 372 andelectrically conductive medium 374 may each include at least one fromthe following group of elements, the group of elements consisting of:Ag, Zn, Sn, Pb, Bi, In, Cu, Au, Pd. Electrically conductive medium 372and electrically conductive medium 374 may include the same or differentmaterials.

In addition, one or more electrically insulated integrated circuit chipsmay each be electrically insulatively bonded onto at least one of firstchip carrier 104 and second chip carrier 112.

Third chip 376 may include a semiconductor integrated circuit logicchip, wherein the semiconductor integrated circuit logic chip mayinclude at least one semiconductor logic device from the group ofsemiconductor logic devices, the group consisting of: an applicationspecific integrated chip ASIC, a driver, a controller, a sensor, amemory. It may be understood that a semiconductor logic chip i.e. alogic integrated circuit chip, may include a low power semiconductordevice, e.g. devices capable of carrying up to 30 V to 150 V.

Third chip 376 may be disposed over first chip carrier 104. Third chip376 may be electrically insulated from first chip carrier 104.

Third chip 376 may include third chip top side 378 and third chip bottomside 382. Third chip bottom side 382, i.e. back side, may be disposedover first chip carrier 104 or disposed over chip backside e.g. SiO₂.

As used herein with respect to lower power semiconductor logic devices,third chip top side 378, may be understood to refer to the side of thechip which carries one or more contact pads, or electrical contacts,wherein bonding pads or electrical connects may be attached; or whereinit is the side of the chip which may be mostly covered by metallizationlayers. Third chip bottom side 382 may be understood to refer to theside of the chip which may be free from metallization or contact pads orelectrical contacts. metallization layers. Third chip bottom side 382may be adhered to first chip carrier 104 by electrically insulatingmedium 384. Therefore, third chip 376 may be electrically insulated fromfirst chip carrier 104 by electrically insulating medium 384.Electrically insulating medium 384 may include at least one from thefollowing group of materials, the group consisting of: an adhesive, anelectrically insulating adhesive, an epoxy, a glue, a paste, an adhesivefoil, an adhesive film, an electrically insulating wafer backsidecoating. Each electrically conductive contact pad may include at leastone material, element or alloy from the following group of materials,the group consisting of: copper, aluminum, silver, tin, gold, zinc,nickel.

Process 320, therefore shows a die attachment process, wherein firstchip 118 and second chip 112 may be attached to respective chip carriersby soldering of an electrically conductive backside interconnect, andthird chip 376 may be attached to first chip carrier 104 by anelectrically insulating die attach process, e.g. electrical insulationdie attach paste or film.

First chip 108, second chip 112 and third chip 114 may each include asemiconductor chip, e.g. a die, which includes a wafer substrate. Thesemiconductor chip may include one or more electronic components formedover the wafer substrate. The wafer substrate may include variousmaterials, e.g. semiconductor materials. The wafer substrate may includeat least one from the following group of materials, the group ofmaterials consisting of: Silicon, Germanium, Group III to V materials,polymers. According to an embodiment, the wafer substrate may includedoped or undoped silicon. According to another embodiment, the wafersubstrate may include a silicon on insulator SOI wafer. According to anembodiment, the wafer substrate may include a semiconductor compoundmaterial, e.g. gallium arsenide (GaAs), indium phosphide (InP).According to an embodiment, the wafer substrate may include a quaternarysemiconductor compound material, e.g. indium gallium arsenide (InGaAs).

In 330, after the completed die-attach processes, the surfaces of thedevices may be roughened, e.g. by a chemical etching process, forimproved adhesion of a subsequent deposition electrically insulatingmaterial 124. During the chemical etching process, first chip carrier104 and second chip carrier 112 may be roughened. For example, firstchip carrier top side 106 and second chip carrier top side 114 may beroughened by the chemical etching process. Furthermore, one or moresides of first chip 118, second chip 122 and third chip 376 may beroughened. For example, first chip top side 348, second chip top side358 and third chip top side 378 may be roughened by the chemical etchingprocess. Adhesion of electrically insulating material 124 to these sidesmay be improved due to the roughening process.

Method 300 may include, in 340 and 350, at least partially surroundingfirst chip carrier 104 and second chip carrier 112 with electricallyinsulating material 124.

Electrically insulating material 124 may include at least one from thefollowing group of materials, the group consisting of: filled orunfilled epoxy, pre-impregnated composite fibers, reinforced fibers,laminate, a mold material, a thermoset material, a thermoplasticmaterial, filler particles, fiber-reinforced laminate, fiber-reinforcedpolymer laminate, fiber-reinforced polymer laminate with fillerparticles.

According to various embodiments, electrically insulating material 124may include an unstructured laminate material with or without one ormore particle fillers. One or more particle fillers may include silicondioxide particle fillers, aluminum oxide particle fillers, e.g. glassfiller particles, e.g. nanoparticles, or glass fibers, silicon dioxideparticle fillers, aluminum oxide. Electrically insulating material 124may be free from prepegs.

Electrically insulating material 124 may be further configured to atleast partially surround first chip 118 and second chip 122.Electrically insulating material 124 may be further configured toelectrically insulate first chip 118 and first chip carrier 104 fromsecond chip 122 and second chip carrier 112. Electrically insulatingmaterial 124 may be formed over first and second chip carrier top sides106, 114, and first and second chip carrier bottom sides 108, 116.

Electrically insulating material 124 may be deposited using one or moredeposition processes. Electrically insulating material 124 may bedeposited such that electrically insulating material 124, i.e.unstructured epoxy may at least partially surround first chip 118,second chip 122 and third chip 376. Electrically insulating material 124may be deposited between first chip 118 and second chip 122.Electrically insulating material 124 may be deposited between first chip118 and third chip 114. Electrically insulating material 124 may bedeposited between first chip carrier 104 and second chip carrier 116.Electrically insulating material 124 may be deposited, such thatelectrically insulating material 124 may at least partially surroundfirst chip carrier 104 and second chip carrier 112. Electricallyinsulating material 124 may be deposited, such that first chip 118 maybe electrically insulated from second chip 122. Electrically insulatingmaterial 124 may be deposited, such that first chip 118 may beelectrically insulated from third chip 376. Electrically insulatingmaterial 124 may be further deposited, e.g. over one or more sides offirst chip 118, second chip 122 and third chip 376. Electricallyinsulating material 124 may be deposited to at least partially surroundfirst chip top side 348, second chip top side 358 and third chip topside 378. Electrically insulating material 124 may be deposited to atleast partially surround one or more lateral sides of each of first chip118, second chip 122 and third chip 376. Electrically insulatingmaterial 124 may be deposited to at least partially surround first chipcarrier top side 106 and second chip carrier top side 114. Electricallyinsulating material 124 formed over first chip carrier top side 106 andsecond chip carrier top side 114 may have a thickness t₁ ranging fromabout 5 μm to about 500 μm, e.g. from about 15 μm to about 150 μm.Electrically insulating material 124 may be deposited to at leastpartially surround first chip carrier bottom side 108 and second chipcarrier bottom side 116. Electrically insulating material 124 formedover first chip carrier bottom side 108 and second chip carrier bottomside 116 may have a thickness t₂ ranging from about 5 μm to about 500μm, e.g. from about 15 μm to about 150 μm.

According to another embodiment, electrically insulating material 124may include first electrically insulating material 386 and secondelectrically insulating material 388. First electrically insulatingmaterial 386, may include structured pre-impregnated composite fibers386, e.g. glass-fibers and glass particles reinforced prepregs. Secondelectrically insulating material 388 may include an unstructuredlaminate material with or without one or more particle fillers. Firstelectrically insulating material 386 may at least partially surroundfirst chip 118, second chip 122 and third chip 376. First electricallyinsulating material 386 may be deposited between first chip 118 andsecond chip 122. First electrically insulating material 386 may bedeposited between first chip 118 and third chip 114. First electricallyinsulating material 386 may be deposited between first chip carrier 104and second chip carrier 116. First electrically insulating material 386may be deposited, such that electrically insulating material 368 may atleast partially surround first chip carrier 104 and second chip carrier112. In a parallel or subsequent process, second electrically insulatingmaterial 388 may be further deposited, e.g. over one or more sides offirst chip 118, second chip 122 and third chip 376. Second electricallyinsulating material 388 may include an unstructured epoxy 388. Secondelectrically insulating material 388 may include glass-fibers and glassparticles reinforced laminate foil, e.g. top side laminate foil 392 andbottom side laminate foil 394. Second electrically insulating material388 may be deposited to at least partially surround first chip top side348, second chip top side 358 and third chip top side 378. Secondelectrically insulating material 388 may be deposited to at leastpartially surround one or more lateral sides of each of first chip 118,second chip 122 and third chip 376. Second electrically insulatingmaterial 388, e.g. top side laminate foil 392, may be deposited to atleast partially surround first chip carrier top side 106 and second chipcarrier top side 114. Second electrically insulating material 388, e.g.bottom side laminate foil 394, may be deposited to at least partiallysurround first chip carrier bottom side 108 and second chip carrierbottom side 116.

It may be understood that adhesion of electrically insulating material124, e.g. at least one of first electrically insulating material 386 andsecond electrically insulating material 388, to first chip carrier 104and second chip carrier 112 may be improved due to the rougheningprocess of 330.

First electrically conductive redistribution material 396 may bedeposited over electrically insulating material 124. First electricallyconductive redistribution material 396 may be deposited over at leastone of first chip carrier top side 106 and second chip carrier top side114. Second electrically conductive redistribution material 398 may bedeposited over electrically insulating material 124. Second electricallyconductive redistribution material 398 may be deposited over at leastone of first chip carrier bottom side 108 and second chip carrier bottomside 116.

First electrically conductive redistribution material 396 may bedisposed over a surface of electrically insulating material 124, e.g.over top surface 3102 of electrically insulating material 124, whereintop surface 3102 may be arranged over at least one of first chip carriertop side 106 and second chip carrier top side 114. Top surface 3102 mayface the same direction which first carrier top side 106 and secondcarrier top side 114 face. Second electrically conductive redistributionmaterial 398 may be disposed over a surface of electrically insulatingmaterial 124, e.g. over bottom surface 3104 of electrically insulatingmaterial 124. Bottom surface 3104 of electrically insulating material124 may face the same direction which first carrier bottom side 108 andsecond carrier bottom side 116 face. Second electrically conductiveredistribution material 398 may be arranged over at least one of firstchip carrier bottom side 108 and second chip carrier bottom side 116.This roughening, i.e. etching process may be performed for one or moreor all subsequent galvanic deposited Cu-layers inside the laminatedpackage.

At least one of first electrically conductive redistribution material396 and second electrically conductive redistribution material 398 mayinclude an electrically conductive foil, e.g. a metal foil, e.g. acopper foil. At least one of first electrically conductiveredistribution material 396 and second electrically conductiveredistribution material 398 may have a thickness ranging from about 5 μmto about 30 μm, e.g. about 10 μm to about 20 μm, e.g. about 15 μm toabout 20 μm.

According to an embodiment, first electrically conductive redistributionmaterial 396, second electrically conductive redistribution material 398and electrically insulating material 124 may be deposited in a parallelprocess, i.e. in the same process.

First electrically conductive redistribution material 396 and secondelectrically conductive redistribution material 398 may be pressed ontoelectrically insulating material 124, e.g. first electrically conductiveredistribution material 396 may be pressed onto top side laminate foil392 and second electrically conductive redistribution material 398 maybe pressed onto bottom side laminate foil 394. First electricallyconductive redistribution material 396 may be pressed onto top surface3102 of electrically insulating material 124. Second electricallyconductive redistribution material 398 may be pressed onto bottomsurface 3104 of electrically insulating material 124. Therefore, firstchip carrier 104, second chip carrier 112, first chip 118, second chip122, and third chip 376 may be sandwiched between first electricallyconductive redistribution material 396, second electrically conductiveredistribution material 398 and electrically insulating material 124.Therefore, an encapsulated chip arrangement as shown in 350 FIG. 3E maybe formed. For example, first electrically conductive redistributionmaterial 396, second electrically conductive redistribution material 398and electrically insulating material 124 may be arranged over atemporary carrier and inserted into a press, e.g. a lamination press.The lamination process may be carried out under vacuum using atemperature process, e.g. at about 200° C. and a pressure process, e.g.at about 10 Torr.

In 360, structuring of first electrically conductive redistributionmaterial 396 and second electrically conductive redistribution material398 may be carried out for subsequent via formation and via fillingprocesses. A photoresist process may be carried out. Photoresist may bedeposited, e.g. laminated over first electrically conductiveredistribution material 396 and second electrically conductiveredistribution material 398. Structuring of the photoresist may becarried out, e.g. using laser direct imaging LDI or a mask process witha mask aligner. Developing may be carried out such that one or moreportions of the photoresist may be removed, and one or more regions offirst electrically conductive redistribution material 396 and secondelectrically conductive redistribution material 398 may be exposed tostructuring, and one or more other regions of first electricallyconductive redistribution material 396 and second electricallyconductive redistribution material 398 may be protected fromstructuring. The structuring process may include etching, which may beused to remove one or more regions 3106 of first electrically conductiveredistribution material 396 and second electrically conductiveredistribution material 398 which were exposed to structuring andremoved during developing. A stripping process may be carried out removeany residue, and remaining photoresist. The removed one or more regions3106 of first electrically conductive redistribution material 396 andsecond electrically conductive redistribution material 398 may exposeone or more regions of electrically insulating material 124 torestructuring.

In 370, laser drilling may be carried out. One or more regions ofelectrically insulating material 124, exposed as a result of the removalof one or more regions 3106 of first electrically conductiveredistribution material 396 and second electrically conductiveredistribution material 398, may be restructured, e.g. by using adrilling process, e.g. laser drilling. The laser drilling may be carriedout, e.g. using a laser, e.g. a CO₂ laser. Laser drilling may be carriedout to produce one or more vias 3108, 3112, i.e. holes.

One or more top side vias 3108 may be formed over at least one of firstchip carrier top side 106 and second chip carrier top side 114. One ormore top side vias 3108 may be formed over at least one of first chiptop side 348, second chip top side 358 and third chip top side 378.

One or more top side vias 3108 may include one or more channels fromfirst electrically conductive redistribution material 396, over topsurface 3102 of electrically insulating material 124, to one or morecontact pads formed over first chip top side 348, e.g. One or more topside vias 3108 may include one or more channels from first electricallyconductive redistribution material 396 to first chip first source/draincontact region 356, e.g. One or more top side vias 3108 may include oneor more channels from first electrically conductive redistributionmaterial 396 to first chip gate contact region 354.

One or more top side vias 3108 may include one or more channels fromfirst electrically conductive redistribution material 396 to one or morecontact pads formed over second chip top side 358, e.g. One or more topside vias 3108 may include one or more channels from first electricallyconductive redistribution material 396 to second chip first source/draincontact region 366, e.g. One or more top side vias 3108 may include oneor more channels from first electrically conductive redistributionmaterial 396 to second chip gate contact region 364

One or more top side vias 3108 may include one or more channels fromfirst electrically conductive redistribution material 396 to one or morecontact pads 3114 formed over third chip top side 378.

One or more top side vias 3108 may include one or more channels fromfirst electrically conductive redistribution material 396 to first chipcarrier top side 106. One or more top side vias 3108 may include one ormore channels from first electrically conductive redistribution material396 to second chip carrier top side 114.

One or more bottom side vias 3112 may be formed over at least one offirst chip carrier bottom side 108 and second chip carrier bottom side116. One or more bottom side vias 3112 may be formed over at least oneof first chip bottom side 352, second chip bottom side 362 and thirdchip bottom side 382.

One or more bottom side vias 3112 may include one or more channels fromsecond electrically conductive redistribution material 398 to first chipcarrier bottom side 108. One or more bottom side vias 3112 may includeone or more channels from second electrically conductive redistributionmaterial 398 to second chip carrier bottom side 116.

In 380, via filling may be carried out to provide contact metallization.One or more electrically interconnects may be deposited to fill one ormore top side vias 3108 and one or more bottom side vias 3112. Duringvia filling process, the thickness of at least one of first electricallyconductive redistribution material 396 and second electricallyconductive redistribution material 398, i.e. the top and bottom Cu layer396 and 398 may be increased to such that a thickness ranging from about20 μm to about 200 μm, e.g. from about 30 μm to about 180 μm, e.g. fromabout 40 μm to about 160 μm, may be attained.

Chemical activation and/or galvanic deposition may be carried out toprovide metallization of the vias for the interconnects. A desmearand/or cleaning process may be carried out, wherein the surfaces of vias3108, 3112 may be prepared for plating. An activation process may becarried out wherein an enabling layer (not shown) may be deposited toenable plating of the side walls of vias 3108, 3112. Enabling layer mayinclude an electrically conductive layer, e.g. conductive organic layeror Pd layer. Subsequently, a plating process may be carried out andelectrically conductive material forming one or more electricallyconductive interconnects may be deposited into vias 3108, 3112.

One or more electrically conductive interconnects may include one ormore top side electrically conductive interconnects 3116 filling one ormore top side vias 3108 and one or more bottom side second electricallyconductive interconnects 3118 filling one or more bottom side vias 3112.At least one of one or more top side electrically conductiveinterconnects 3116 and one or more bottom side second electricallyconductive interconnects 3118 may include at least one from thefollowing group of materials, the group of materials consisting of:copper, nickel, iron, copper alloy, nickel alloy, iron alloy.

One or more top side electrically conductive interconnects 3116 may beformed over at least one of first chip carrier top side 106 and secondchip carrier top side 114. One or more top side electrically conductiveinterconnects 3116 may be formed over at least one of first chip topside 348, second chip top side 358 and third chip top side 378.

One or more top side electrically conductive interconnects 3116 mayelectrically connect first electrically conductive redistributionmaterial 396 to one or more contact pads formed over first chip top side348, e.g. One or more top side electrically conductive interconnects3116 may electrically connect first electrically conductiveredistribution material 396 to first chip first source/drain contactregion 356, e.g. One or more top side electrically conductiveinterconnects 3116 may electrically connect first electricallyconductive redistribution material 396 to first chip gate contact region354.

One or more top side electrically conductive interconnects 3116 mayelectrically connect first electrically conductive redistributionmaterial 396 to one or more contact pads formed over second chip topside 358, e.g. One or more top side electrically conductiveinterconnects 3116 may electrically connect first electricallyconductive redistribution material 396 to second chip first source/draincontact region 366, e.g. One or more top side electrically conductiveinterconnects 3116 may electrically connect first electricallyconductive redistribution material 396 to second chip gate contactregion 364.

One or more top side electrically conductive interconnects 3116 mayelectrically connect first electrically conductive redistributionmaterial 396 to one or more contact pads 3114 formed over third chip topside 378.

One or more top side electrically conductive interconnects 3116 mayelectrically connect first electrically conductive redistributionmaterial 396 to first chip carrier top side 106. One or more top sideelectrically conductive interconnects 3116 may electrically connectfirst electrically conductive redistribution material 396 to second chipcarrier top side 114.

One or more bottom side electrically conductive interconnects 3118 maybe formed over at least one of first chip carrier bottom side 108 andsecond chip carrier bottom side 116. One or more bottom sideelectrically conductive interconnects 3118 may electrically connect atleast one of first chip bottom side 352, second chip bottom side 362 andthird chip bottom side 382.

One or more bottom side electrically conductive interconnects 3118 mayelectrically connect second electrically conductive redistributionmaterial 398 to first chip carrier bottom side 108. One or more bottomside second electrically conductive interconnects 3118 may electricallyconnect second electrically conductive redistribution material 398 tosecond chip carrier bottom side 116.

In 380, during via filling, at least one electrical interconnect 126 maybe deposited, which electrically contacts first chip 118 to second chip122 through electrically insulating material 124. At least oneelectrical interconnect 126 may include at least one of one or more topside electrically conductive interconnects 3116.

At least one electrical interconnect 126 may be configured toelectrically contact first chip 118 to second chip 122 via first chipcarrier 104. At least one electrical interconnect 126 may be configuredto electrically connect one or more contact pads, e.g. second chip firstsource/drain region 366, formed over second chip front side 368 to firstchip carrier 104, wherein first chip 118 may be in electricallyconnection with first chip carrier 104.

According to another embodiment, at least one electrical interconnect126 may be configured to electrically contact first chip 118 to secondchip 122 via second chip carrier 112. At least one electricalinterconnect 126 may be configured to electrically connect one or morecontact pads, e.g. first chip first source/drain region 356, formed overfirst chip front side 348 to second chip carrier 112, wherein secondchip 122 may be in electrically connection with second chip carrier 112.

At least one electrical interconnect 126 may include at least one fromthe following group of electrical interconnects, the group consistingof: wires, electrically conductive wires, bond wires, clips,electrically conductive clips, galvanically deposited interconnects.

At least one further electrical interconnect 327 may electricallyconnect first chip 118 to third chip 376, e.g. At least one furtherelectrical interconnect 327 may electrically connect one or more contactpads 354, 356 formed over first chip top side 348 to one or more contactpads 3114 formed over third chip top side 378.

At least one electrical interconnect 126 may include portions of one ormore electrical interconnects 3116 and first electrically conductiveredistribution material 396. At least one further electricalinterconnect 327 may include other portions of one or more electricalinterconnects 3116 and first electrically conductive redistributionmaterial 396.

In 390, restructuring may be carried out to selectively remove regionsof at least one of first electrically conductive portions 396 andsurface portions of one or more top side electrically conductiveinterconnects 3116 formed over top surface 3102 of electricallyinsulating material 124.

Optionally, restructuring of second electrically conductiveredistribution material 398 and bottom side electrically conductiveinterconnects 3118 formed over bottom surface 3104 of electricallyinsulating material 124 may be carried out as well. Selective removal ofthe deposited metal layers including electrically conductive portions396 and/or electrically conductive interconnects 3116 formed over topsurface 3102 of electrically insulating material 124 may be carried out,e.g. by etching of deposited metal, e.g. by etching of galvanicallydeposited Cu for the device interconnect redistribution.

Selective removal may be carried out through a photoresist process. Forexample, photoresist may be deposited, e.g. laminated, over firstelectrically conductive redistribution material 396 and surface portionsof one or more top side electrically conductive interconnects 3116.Optionally, this may be carried out for second electrically conductiveredistribution material 398 and bottom side electrically conductiveinterconnects 3118 as well. Structuring of the photoresist may becarried out, e.g. using laser direct imaging LDI or a mask process witha mask aligner. Developing may be carried out such that one or moreportions of the photoresist may be removed, such that one or moreregions of first electrically conductive redistribution material 396 andone or more surface portions of one or more top side electricallyconductive interconnects 3116 formed over top surface 3102 ofelectrically insulating material 124 may be exposed to structuring,while other regions may be protected from structuring. In case selectiveremoval is carried out for second electrically conductive redistributionmaterial 398 and bottom side electrically conductive interconnects 3118as well, developing may be carried out such that one or more portions ofthe photoresist may be removed, such that one or more regions of secondelectrically conductive redistribution material 398 and one or moresurface portions of one or more bottom side electrically conductiveinterconnects 3118 formed over bottom surface 3104 of electricallyinsulating material 124 may be exposed to structuring as well.

The structuring process may include etching, which may be used to removeone or more regions 3122 of first electrically conductive redistributionmaterial 396 and/or one or more regions 3122 of one or more top sideelectrically conductive interconnects 3116.

A stripping process may be carried out remove any residue, and remainingphotoresist. Therefore, one or more first electrically conductiveportions 128 and one or more second electrically conductive portions 132may be formed over electrically insulating material 124. One or morefirst electrically conductive portions 128 may include portions of firstelectrically conductive redistribution material 396 formed over topsurface 3102 of electrically insulating material 124 as well as one ormore top side electrically conductive interconnects 3116. One or moresecond electrically conductive portions 132 may include portions ofsecond electrically conductive redistribution material 398 formed overbottom surface 3104 of electrically insulating material 124 and one ormore bottom side electrically conductive interconnects 3118.

Forming one or more first electrically conductive portions 128 and oneor more second electrically conductive portions 132 over electricallyinsulating material 124 may include forming one or more firstelectrically conductive portions 128 over and electrically contactingone or more first electrically conductive portions 128 to at least oneof first chip carrier top side 106 and second chip carrier top side 114,and forming one or more second electrically conductive portions 132 overand electrically contacting one or more first electrically conductiveportions 132 to at least one of first chip carrier bottom side 108 andsecond chip carrier bottom side 116.

One or more first electrically conductive portions 128 may beelectrically contacted to and formed over at least one of first chipfront side 348 and second chip front side 358. One or more firstelectrically conductive portions 128 may be electrically contacted toand formed over at least one of: one or more contact pads, e.g. 354, 356formed over first chip front side, and one or more contact pads, 364,366, formed over second chip front side.

One or more first electrically conductive portions 128 may be formedover at least one of first chip carrier top side 106 and second chipcarrier top side 114. One or more first electrically conductive portions128 may be formed over at least one of first chip top side 348, secondchip top side 358 and third chip top side 378.

One or more first electrically conductive portions 128 may electricallyconnect first electrically conductive redistribution material 396 to oneor more contact pads formed over first chip top side 348, e.g. One ormore first electrically conductive portions 128 may electrically connectfirst electrically conductive redistribution material 396 to first chipfirst source/drain contact region 356, e.g. One or more firstelectrically conductive portions 128 may electrically connect firstelectrically conductive redistribution material 396 to first chip gatecontact region 354.

One or more first electrically conductive portions 128 may electricallyconnect electrically conductive portion 396 to one or more contact padsformed over second chip top side 358, e.g. One or more firstelectrically conductive portions 128 may electrically connect firstelectrically conductive redistribution material 396 to second chip firstsource/drain contact region 366, e.g. One or more first electricallyconductive portions 128 may electrically connect first electricallyconductive redistribution material 396 to second chip gate contactregion 364.

One or more first electrically conductive portions 128 may electricallyconnect first electrically conductive redistribution material 396 to oneor more contact pads 3114 formed over third chip top side 378.

One or more first electrically conductive portions 128 may electricallyconnect first electrically conductive redistribution material 396 tofirst chip carrier top side 106. One or more first electricallyconductive portions 128 may electrically connect first electricallyconductive redistribution material 396 to second chip carrier top side114.

One or more second electrically conductive portions 132 may be formedover at least one of first chip carrier bottom side 108 and second chipcarrier bottom side 116. One or more second electrically conductiveportions 132 may electrically connect at least one of first chip bottomside 352, second chip bottom side 362 and third chip bottom side 382.

One or more second electrically conductive portions 132 may electricallyconnect second electrically conductive redistribution material 398 tofirst chip carrier bottom side 108. One or more second electricallyconductive portions 132 may electrically connect second electricallyconductive redistribution material 398 to second chip carrier bottomside 116.

It may be understood that each of one or more first electricallyconductive portions 128 may be electrically insulated from each other byelectrically insulating material 124, or electrically connected to eachthrough or over electrically insulating material 124 depending on theelectrical circuitry design of the device package. Each of one or moresecond electrically conductive portions 132 may be electricallyinsulated from each other by electrically insulating material 124, orelectrically connected to each through or over electrically insulatingmaterial 124 depending on the electrical circuitry design of the devicepackage.

FIGS. 4A to 4C show a method for forming a chip arrangement according toan embodiment. Method 400 may include one or more or all of theprocesses already described with respect to at least one of method 200and method 300. Method 400 may include one or more or all of thefeatures described with respect to processes 310 to 390.

According to an embodiment, method 400 may include processes 310 to 390.In addition, method 400 may further include processes 410 to 430.

In 410, an additional redistribution layer may be formed over at leastone side of the package for device interconnection. Process 410 mayinclude deposition of further electrically insulating material 3124 andthird electrically conductive redistribution material 3126 and footprintstructuring.

Further electrically insulating material 3124 may be deposited to atleast partially surround one or more first electrically conductiveportions 128. For example, further electrically insulating material 3124may be deposited to at least partially surround first electricallyconductive redistribution material 396. Further electrically insulatingmaterial 3124 may be deposited over electrically insulating material124. Further electrically insulating material 3124 may be deposited overtop surface 3102 of electrically insulating material 124. Furtherelectrically insulating material 3124 may be deposited over at least oneof first chip carrier top side 106 and second chip carrier top side 114.

Further electrically insulating material 3124 may include at least onefrom the following group of materials, the group consisting of: filledor unfilled epoxy, pre-impregnated composite fibers, reinforced fibers,laminate, a mold material, a thermoset material, a thermoplasticmaterial, filler particles, fiber-reinforced laminate, fiber-reinforcedpolymer laminate, fiber-reinforced polymer laminate with fillerparticles.

Electrically insulating material 124 and further electrically insulatingmaterial 3124 may include the same or different materials.

Further electrically insulating material 3124 deposited over at leastone of first chip carrier top side 106 and second chip carrier top side114 may have a thickness t3 ranging from about 5 μm to about 500 μm,e.g. about 15 μm to about 150 μm.

Third electrically conductive redistribution material 3126 may bedeposited over further electrically insulating material 3124. Thirdelectrically conductive redistribution material 3126 may be depositedover at least one of first chip carrier top side 106 and second chipcarrier top side 114.

Third electrically conductive redistribution material 3126 may bedisposed over a surface of further electrically insulating material3124, e.g. over top surface 3128 of further electrically insulatingmaterial 3124, wherein top surface 3128 may be arranged over at leastone of first chip carrier top side 106 and second chip carrier top side114.

Top surface 3128 of further electrically insulating material 3124 mayface a same direction as top surface 3102 of electrically insulatingmaterial 124.

Third electrically conductive redistribution material 3126 may includean electrically conductive foil, e.g. a metal foil, e.g. a copper foil.Third electrically conductive redistribution material 3126 may includean electrically conductive layer having a thickness ranging from about 5μm to about 50 μm, e.g. about 10 μm to about 30 μm, e.g. about 15 μm toabout 25 μm.

Third electrically conductive redistribution material 3126 may bepressed onto electrically insulating material, e.g. third electricallyconductive redistribution material 3126 may be pressed onto furtherelectrically insulating material 3124, e.g. onto top surface 3128 offurther electrically insulating material 3124.

Structuring of third electrically conductive redistribution material3126 may be carried out for subsequent via formation and via fillingprocesses. A photoresist process may be carried out. For example,photoresist may be deposited, e.g. laminated over third electricallyconductive redistribution material 3126. Structuring of the photoresistmay be carried out, e.g. using laser direct imaging LDI or a maskprocess with a mask aligner. Developing may be carried out such that oneor more portions of the photoresist may be removed, and one or moreregions of third electrically conductive redistribution material 3126may be exposed to structuring, and one or more other regions of thirdelectrically conductive redistribution material 3126 may be protectedfrom structuring. The structuring process may include etching, which maybe used to remove one or more regions of third electrically conductiveredistribution material 3126 which were exposed to structuring. Astripping process may be carried out remove any residue, and remainingphotoresist. The removed one or more regions of third electricallyconductive redistribution material 3126 may expose one or more regionsof further electrically insulating material 3124 to restructuring.

Laser drilling of further electrically insulating material 3124 may becarried out. One or more regions of further electrically insulatingmaterial 3124, exposed as a result of the removal of one or more regionsof third electrically conductive redistribution material 3126, may berestructured, e.g. by using a drilling process, e.g. laser drilling. Thelaser drilling may be carried out, e.g. using a laser, e.g. a CO2 laser.Laser drilling may be carried out to produce one or more further vias,i.e. holes.

One or more further top side vias may be formed over at least one offirst chip carrier top side 106 and second chip carrier top side 114.One or more further top side vias may be formed over at least one offirst chip top side 348, second chip top side 358 and third chip topside 378.

One or more further top side vias may include one or more channels fromthird electrically conductive redistribution material 3126 to one ormore first electrically conductive portions 128, e.g. One or morefurther top side vias may include one or more channels from thirdelectrically conductive redistribution material 3126 to firstelectrically conductive redistribution material 396, wherein firstelectrically conductive redistribution material 396 may be electricallycontacted to first chip first source/drain contact region 356, e.g. Oneor more further top side vias may include one or more channels fromthird electrically conductive redistribution material 3126 to firstelectrically conductive redistribution material 396, wherein firstelectrically conductive redistribution material 396 may be electricallycontacted to first chip gate contact region 354.

One or more further top side vias may include one or more channels fromthird electrically conductive redistribution material 3126 to firstelectrically conductive redistribution material 396, wherein firstelectrically conductive redistribution material 396 may be electricallycontacted to one or more contact pads formed over second chip top side358, e.g. One or more further top side vias may include one or morechannels from third electrically conductive redistribution material 3126to first electrically conductive redistribution material 396, whereinfirst electrically conductive redistribution material 396 may beelectrically contacted to second chip first source/drain contact region366, e.g. One or more further top side vias may include one or morechannels from third electrically conductive redistribution material 3126to first electrically conductive redistribution material 396, whereinfirst electrically conductive redistribution material 396 may beelectrically contacted to second chip gate contact region 364.

One or more further top side vias may include one or more channels fromthird electrically conductive redistribution material 3126 to firstelectrically conductive redistribution material 396, wherein firstelectrically conductive redistribution material 396 may be electricallycontacted to one or more contact pads 3114 formed over third chip topside 378.

One or more further top side vias may include one or more channels fromthird electrically conductive redistribution material 3126 to firstelectrically conductive redistribution material 396, wherein firstelectrically conductive redistribution material 396 may be electricallycontacted to first chip carrier top side 106. One or more further topside vias may include one or more channels from third electricallyconductive redistribution material 3126 to first electrically conductiveredistribution material 396, wherein first electrically conductiveredistribution material 396 may be electrically contacted to second chipcarrier top side 114.

Via filling may be carried out to provide contact metallization. One ormore further top side electrical interconnects 3132 may be deposited tofill one or more further top side vias. At least one of one or morefurther top side electrical interconnects 3132 may include at least onefrom the following group of materials, the group of materials consistingof: copper, nickel, iron, copper alloy, nickel alloy, iron alloy. Duringvia filling process, the top and bottom Cu layer 396 and 398 may beincreased to such that a thickness ranging from about 10 μm to about 200μm, e.g. from about 20 μm to about 150 μm, may be attained.

Chemical activation and/or galvanic deposition may be carried out toprovide metallization of the vias for the interconnects. A desmearand/or cleaning process may be carried out, wherein the surfaces of oneor more further top side vias may be prepared for plating. An activationprocess may be carried out wherein an enabling layer may be deposited toenable plating of the side walls of one or more further top side vias.Enabling layer may include an electrically conductive layer, e.g.conductive organic layer or Pd layer. Subsequently, a plating processmay be carried out and electrically conductive material forming one ormore electrically conductive interconnects may be deposited into one ormore further top side vias.

One or more further top side electrical interconnects 3132 mayelectrically connect third electrically conductive redistributionmaterial 3126 to one or more first electrically conductive portions 128,e.g. One or more further top side electrical interconnects 3132 mayelectrically connect third electrically conductive redistributionmaterial 3126 to first electrically conductive redistribution material396, wherein first electrically conductive redistribution material 396may be electrically contacted to first chip first source/drain contactregion 356, e.g. One or more further top side electrical interconnects3132 may electrically connect third electrically conductiveredistribution material 3126 to first electrically conductiveredistribution material 396, wherein first electrically conductiveredistribution material 396 may be electrically contacted to first chipgate contact region 354.

One or more further top side electrical interconnects 3132 mayelectrically connect third electrically conductive redistributionmaterial 3126 to first electrically conductive redistribution material396, wherein first electrically conductive redistribution material 396may be electrically contacted to one or more contact pads formed oversecond chip top side 358, e.g. One or more further top side electricalinterconnects 3132 may electrically connect third electricallyconductive redistribution material 3126 to first electrically conductiveredistribution material 396, wherein first electrically conductiveredistribution material 396 may be electrically contacted to second chipfirst source/drain contact region 366, e.g. One or more further top sideelectrical interconnects 3132 may electrically connect thirdelectrically conductive redistribution material 3126 to firstelectrically conductive redistribution material 396, wherein firstelectrically conductive redistribution material 396 may be electricallycontacted to second chip gate contact region 364.

One or more further top side electrical interconnects 3132 mayelectrically connect third electrically conductive redistributionmaterial 3126 to first electrically conductive redistribution material396, wherein first electrically conductive redistribution material 396may be electrically contacted to one or more contact pads 3114 formedover third chip top side 378.

One or more further top side electrical interconnects 3132 mayelectrically connect third electrically conductive redistributionmaterial 3126 to first electrically conductive redistribution material396, wherein first electrically conductive redistribution material 396may be electrically contacted to first chip carrier top side 106. One ormore further top side electrical interconnects 3132 may electricallyconnect third electrically conductive redistribution material 3126 tofirst electrically conductive redistribution material 396, wherein firstelectrically conductive redistribution material 396 may be electricallycontacted to second chip carrier top side 114.

Restructuring may be carried out to selectively remove regions of atleast one of third electrically conductive redistribution material 3126and/or one or more further top side electrical interconnects 3132 formedover top surface 3128 of further electrically insulating material 3124.

Optionally, restructuring of second electrically conductiveredistribution material 398 and bottom side electrically conductiveinterconnects 3118 may be carried out as well, e.g. as a parallelprocess, if not carried out yet carried out in process 390.

Selective removal of the deposited metal layers over top surface 3128 offurther electrically insulating material 3124 may be carried out.Selective removal may include the selective removal of thirdelectrically conductive redistribution material 3126 and one or morefurther top side electrical interconnects 3132 e.g. by etching ofdeposited metal, e.g. by etching of galvanically deposited Cu for thedevice interconnect redistribution.

Selective removal may be carried out through a photoresist process. Forexample, photoresist may be deposited, e.g. laminated, over thirdelectrically conductive redistribution material 3126 and surfaceportions of one or more further top side electrical interconnects 3132.In other words, photoresist may be deposited over top surface 3128 offurther electrically insulating material 3124. Structuring of thephotoresist may be carried out, e.g. using laser direct imaging LDI or amask process with a mask aligner. Developing may be carried out suchthat one or more portions of the photoresist may be removed, such thatone or more regions of third electrically conductive redistributionmaterial 3126 formed over top surface 3128 of further electricallyinsulating material 3124, and/or one or more surface portions of one ormore further top side electrical interconnects 3132 formed over topsurface 3128 of further electrically insulating material 3124, may beexposed to structuring, while other regions may be protected fromstructuring. The structuring process may include etching, which may beused to remove one or more regions 3134 of third electrically conductiveredistribution material 3126 formed over top surface 3128 of furtherelectrically insulating material 3124, and/or one or more surfaceportions 3134 of one or more further top side electrical interconnects3132 formed over top surface 3128 of further electrically insulatingmaterial 3124.

A stripping process may be carried out remove any residue, and remainingphotoresist. Therefore, one or more third electrically conductiveportions 3136 may be formed over electrically insulating material 124,and further electrically insulating material 3124. One or more thirdelectrically conductive portions 3136 may include portions of thirdelectrically conductive redistribution material 3126 and one or morefurther top side electrical interconnects 3132.

One or more third electrically conductive portions 3136 may beelectrically connected to one or more first electrically conductiveportions 128, e.g. One or more third electrically conductive portions3136 may be electrically connected to first electrically conductiveredistribution material 396, wherein first electrically conductiveredistribution material 396 may be electrically contacted to first chipfirst source/drain contact region 356, e.g. One or more thirdelectrically conductive portions 3136 may be electrically connected tofirst electrically conductive redistribution material 396, wherein firstelectrically conductive redistribution material 396 may be electricallycontacted to first chip gate contact region 354.

One or more third electrically conductive portions 3136 may beelectrically connected to first electrically conductive redistributionmaterial 396, wherein first electrically conductive redistributionmaterial 396 may be electrically contacted to one or more contact padsformed over second chip top side 358, e.g. One or more thirdelectrically conductive portions 3136 may be electrically connected tofirst electrically conductive redistribution material 396, wherein firstelectrically conductive redistribution material 396 may be electricallycontacted to second chip first source/drain contact region 366, e.g. Oneor more third electrically conductive portions 3136 may be electricallyconnected to first electrically conductive redistribution material 396,wherein first electrically conductive redistribution material 396 may beelectrically contacted to second chip gate contact region 364.

One or more third electrically conductive portions 3136 may beelectrically connected to first electrically conductive redistributionmaterial 396, wherein first electrically conductive redistributionmaterial 396 may be electrically contacted to one or more contact pads3114 formed over third chip top side 378.

One or more third electrically conductive portions 3136 may beelectrically connected to first electrically conductive redistributionmaterial 396, wherein first electrically conductive redistributionmaterial 396 may be electrically contacted to first chip carrier topside 106. One or more third electrically conductive portions 3136 may beelectrically connected to first electrically conductive redistributionmaterial 396, wherein first electrically conductive redistributionmaterial 396 may be electrically contacted to second chip carrier topside 114.

One or more third electrically conductive portions 3136 may be formedover further electrically insulating material 3124, wherein one or morethird electrically conductive portions 3136 may be formed over andelectrically contacted to at least one of first chip carrier top side106 and second chip carrier top side 114.

Therefore, one or more third electrically conductive portions 3136 mayinclude portions of third electrically conductive redistributionmaterial 3136 formed over top surface 3128 of further electricallyinsulating material 3124 as well as one or more further top sideelectrically conductive interconnects 3132.

One or more third electrically conductive portions 3136 may beelectrically contacted to and formed over at least one of first chipfront side 348 and second chip front side 358.

One or more third electrically conductive portions 3136 may beelectrically contacted to one or more first electrically conductiveportions 128 through further electrically insulating material 3124.

Each of one or more third electrically conductive portions 3136 may beelectrically insulated from each other by further electricallyinsulating material 3124, or electrically connected to each through orover electrically insulating material 3124 depending on the electricalcircuitry design of the device package.

At least one electrical interconnect 126 and at least one furtherelectrical interconnect 327 may be electrically insulated from eachother by at least one of electrically insulating material 124 andfurther electrically insulating material 3124.

In 420, lamination layer 3138 may be formed over top surface 3128 offurther electrically insulating material 3124. Lamination layer 3138 maybe formed over one or more third electrically conductive portions 3136.Lamination layer 3138 may provide electrical insulation for the device.Lamination layer 3138 may have a thickness t_(L) ranging from about 5 μmto about 500 μm, e.g. from about 15 μm to about 150 μm. Lamination layer3138 may include at least one from the following group of materials, thegroup consisting of: epoxy, solder resist, varnish.

In 430, a plating process may be carried out. Plating layer 3142 may beformed over one or more second electrically conductive portions 132,e.g. second electrically conductive redistribution material 398deposited over bottom surface 3104 of electrically insulating material124. Plating layer 3142 may include an electrically conductive layer.Plating layer 3142 may include at least one from the followingmaterials, the group consisting of: nickel gold, palladium, nickel-goldNiAu, nickel-palladium NiPd, nickel-palladium-gold, NiPdAu. Platinglayer 3142 may be deposited by plating, wherein plating layer 3142 mayhave a thickness tP ranging from about 100 nm to about 50 μm, e.g. fromabout 1 μm to about 10 μm. Plating may be deposited on the exposedsecond electrically conductive portions 132 for subsequent solderingonto a printed circuit board PCB, wherein the PCB may include a metalfoil, e.g. a Cu foil.

FIG. 5 shows chip arrangement 502 according to an embodiment.

Chip arrangement 502, e.g. a chip package, may include first chipcarrier 104, wherein first chip carrier 104 may include first chipcarrier top side 106 and first chip carrier bottom side 108. Chiparrangement 502 may include second chip carrier 112, wherein second chipcarrier 112 may include second chip carrier top side 114 and second chipcarrier bottom side 116. Chip arrangement 502 may include first chip118, e.g. a semiconductor chip, e.g. a semiconductor die, electricallyconnected to first chip carrier top side 106, and second chip 122electrically connected to second chip carrier top side 114. Chiparrangement 502 may include electrically insulating material 124configured to at least partially surround first chip carrier 104 andsecond chip carrier 106. Chip arrangement 502 may include at least oneelectrical interconnect 126 configured to electrically contact firstchip 118 to second chip 122 through electrically insulating material124. Chip arrangement 502 may include one or more first electricallyconductive portions 128 and one or more second electrically conductiveportions 132 formed over electrically insulating material 124, whereinone or more first electrically conductive portions 128 may be formedover and electrically contacted to at least one of first chip carriertop side 106 and second chip carrier top side 114, and wherein one ormore second electrically conductive portions 132 may be formed over andelectrically contacted to at least one of first chip carrier bottom side108 and second chip carrier bottom side 116.

First chip 118 and second chip 122 may each include a powersemiconductor chip. A power semiconductor chip may include at least onepower semiconductor device from the group of power semiconductordevices, the group consisting of: a power transistor, a power MOStransistor, a power bipolar transistor, a power field effect transistor,a power insulated gate bipolar transistor, a thyristor, a MOS controlledthyristors, a silicon controlled rectifier, a power schottky diode, asilicon carbide diode, a gallium nitride device.

First chip 118 may be electrically connected to first chip carrier topside 106 via at least one contact pad 357, formed over a first chip backside 352. Second chip 122 may be electrically connected to second chipcarrier top side 114 via at least one contact pad 368 formed over secondchip back side 362.

Chip arrangement 502 may further include third chip 376 disposed overand electrically insulated from first chip carrier 104, and electricallyconnected to first chip 118 via at least one further electricalinterconnect 327.

Third chip 376 may include a semiconductor logic chip. A semiconductorlogic chip includes at least one semiconductor logic device from thegroup of semiconductor logic devices, the group consisting of: anapplication specific integrated circuit ASIC, a driver, a controller, asensor, a memory.

Third chip back side 382 may be disposed over first chip carrier 104.

Third chip 376 may be electrically insulated from first chip carrier 104by an electrically insulating medium 384. Electrically insulating medium384 may include at least one from the following group of materials, thegroup consisting of: an adhesive, an electrically insulating adhesive,an epoxy, glue, a paste, an adhesive foil.

First chip carrier 104 may include a first lead frame carrier. Secondchip carrier 112 may include a second lead frame carrier.

At least one of first chip carrier 104 and second chip carrier 112 mayinclude at least one from the following group of materials, the group ofmaterials consisting of: copper, nickel, iron, copper alloy, nickelalloy, iron alloy.

Electrically insulating material 124 may be further configured to atleast partially surround first chip 118 and second chip 122.

Electrically insulating material 124 may be further configured toelectrically insulate first chip 118 and first chip carrier 104 fromsecond chip 122 and second chip carrier 112.

Electrically insulating material 124 may be formed over first and secondchip carrier top sides 106, 114, and first and second chip carrierbottom sides 108, 116.

At least one electrical interconnect 126 may be configured toelectrically contact first chip 118 to second chip 122 via first chipcarrier 104.

At least one electrical interconnect 126 may be configured toelectrically connect one or more contact pads 364, 366 formed oversecond chip front side 358 to first chip carrier 104.

At least one electrical interconnect 126 may include at least one fromthe following group of electrical interconnects, the group consistingof: wires, electrically conductive wires, bond wires, clips,electrically conductive clips, galvanically deposited interconnects.

One or more first electrically conductive portions 128 may beelectrically contacted to and formed over at least one of first chipfront side 348 and second chip front side 358.

One or more first electrically conductive portions 128 may beelectrically contacted to and formed over at least one of: one or morecontact pads 354, 356 formed over first chip front side 348, and one ormore contact pads 364, 366 formed over second chip front side 358.

Chip arrangement 502 may further include further electrically insulatingmaterial 3124 configured to at least partially surround one or morefirst electrically conductive portions 128.

Chip arrangement 502 may further include one or more third electricallyconductive portions 3136 formed over further electrically insulatingmaterial 3124, wherein one or more third electrically conductiveportions 3136 may be formed over and electrically contacted to at leastone of first chip carrier top side 106 and second chip carrier top side114.

One or more third electrically conductive portions 3136 may beelectrically contacted to and formed over at least one of first chipfront side 348 and second chip front side 358.

One or more third electrically conductive portions 3136 may beelectrically contacted to one or more first electrically conductiveportions 128 through further electrically insulating material 3124.

At least one of electrically insulating material 124 and furtherelectrically insulating material 3124 may include at least one from thefollowing group of materials, the group consisting of: filled orunfilled epoxy, pre-impregnated composite fibers, reinforced fibers,laminate, a mold material, a thermoset material, a thermoplasticmaterial, filler particles, fiber-reinforced laminate, fiber-reinforcedpolymer laminate, fiber-reinforced polymer laminate with fillerparticles, e.g. glass fibers, glass particles and nanoparticles.

Various embodiments provide one or more processes for forming a chiparrangement, wherein processes may also be used for PCB manufacturing.

Various embodiments provide a multi-chip package with increased andtherefore higher integration density.

Various embodiments provide a modular package with excellent thermal andelectrical device performance

Various embodiments provide a simplified manufacturing process forforming a multi-chip arrangement.

Various embodiments provide a process for forming a chip arrangementwherein parallel, i.e. batch device manufacturing may be implemented.

Various embodiments provide a chip arrangement including: a first chipcarrier including a first chip carrier top side and a first chip carrierbottom side; a second chip carrier including a second chip carrier topside and a second chip carrier bottom side; a first chip electricallyconnected to the first chip carrier top side; a second chip electricallyconnected to the second chip carrier top side; an electricallyinsulating material configured to at least partially surround the firstchip carrier and the second chip carrier; at least one electricalinterconnect configured to electrically contact the first chip to thesecond chip through the electrically insulating material; and one ormore first electrically conductive portions and one or more secondelectrically conductive portions formed over the electrically insulatingmaterial, wherein the one or more first electrically conductive portionsare formed over and electrically contacted to at least one of the firstchip carrier top side and second chip carrier top side, and wherein theone or more second electrically conductive portions are formed over andelectrically contacted to at least one of the first chip carrier bottomside and second chip carrier bottom side.

According to an embodiment, the first chip and the second chip eachincludes a power semiconductor chip.

According to an embodiment, the power semiconductor chip includes atleast one power semiconductor device from the group of powersemiconductor devices, the group consisting of: a power transistor, apower MOS transistor, a power bipolar transistor, a power field effecttransistor, a power insulated gate bipolar transistor, a thyristor, aMOS controlled thyristors, a silicon controlled rectifier, a powerschottky diode, a silicon carbide diode, a gallium nitride device.

According to an embodiment, the first chip is electrically connected tothe first chip carrier top side via at least one contact pad formed overa first chip back side; and wherein the second chip is electricallyconnected to the second chip carrier top side via at least one contactpad formed over a second chip back side.

According to an embodiment, the chip arrangement further includes athird chip disposed over and electrically insulated from the first chipcarrier, and electrically connected to the first chip via at least onefurther electrical interconnect.

According to an embodiment, the chip arrangement further includes atleast one other further electrical interconnect configured toelectrically connect the third chip to the second chip.

According to an embodiment, the third chip includes a semiconductorlogic chip.

According to an embodiment, the semiconductor logic chip includes atleast one semiconductor logic device from the group of semiconductorlogic devices, the group consisting of: an application specificintegrated circuit ASIC, a driver, a controller, a sensor, a memory.

According to an embodiment, the third chip back side is disposed overthe first chip carrier.

According to an embodiment, the third chip is electrically insulatedfrom the first chip carrier by an electrically insulating medium, theelectrically insulating medium including at least one from the followinggroup of materials, the group consisting of: an adhesive, anelectrically insulating adhesive, an epoxy, glue, a paste, an adhesivefoil, an electrically insulating organic wafer backside coating.

According to an embodiment, the first chip carrier includes a first leadframe carrier; and the second chip carrier includes a second lead framecarrier.

According to an embodiment, at least one of the first chip carrier andthe second chip carrier includes at least one from the following groupof materials, the group of materials consisting of: copper, nickel,iron, copper alloy, nickel alloy, iron alloy.

According to an embodiment, the electrically insulating material isfurther configured to at least partially surround the first chip and thesecond chip.

According to an embodiment, the electrically insulating material isfurther configured to electrically insulate the first chip and the firstchip carrier from the second chip and the second chip carrier.

According to an embodiment, the electrically insulating material isformed over the first and the second chip carrier top sides, and thefirst and the second chip carrier bottom sides.

According to an embodiment, the at least one electrical interconnect isconfigured to electrically contact the first chip to the second chip viathe first chip carrier.

According to an embodiment, the at least one electrical interconnect isconfigured to electrically connect one or more contact pads formed overa second chip front side to first chip carrier.

According to an embodiment, the at least one electrical interconnectincludes at least one from the following group of electricalinterconnects, the group consisting of: wires, electrically conductivewires, bond wires, clips, electrically conductive clips, galvanicallydeposited interconnects.

According to an embodiment, the one or more first electricallyconductive portions are electrically contacted to and formed over atleast one of a first chip front side and a second chip front side.

According to an embodiment, the one or more first electricallyconductive portions are electrically contacted to and formed over atleast one of: one or more contact pads formed over a first chip frontside, and one or more contact pads formed over a second chip front side.

According to an embodiment, the chip arrangement further includes afurther electrically insulating material configured to at leastpartially surround one or more first electrically conductive portions.

According to an embodiment, chip arrangement further includes one ormore third electrically conductive portions formed over the furtherelectrically insulating material, wherein the one or more thirdelectrically conductive portions are formed over and electricallycontacted to at least one of the first chip carrier top side and thesecond chip carrier top side.

According to an embodiment, the one or more third electricallyconductive portions are electrically contacted to and formed over atleast one of a first chip front side and a second chip front side.

According to an embodiment, the one or more third electricallyconductive portions are electrically contacted to one or more firstelectrically conductive portions through the further electricallyinsulating material.

According to an embodiment, the electrically insulating materialincludes at least one from the following group of materials, the groupconsisting of: filled or unfilled epoxy, pre-impregnated compositefibers, reinforced fibers, laminate, a mold material, a thermosetmaterial, a thermoplastic material, filler particles, fiber-reinforcedlaminate, fiber-reinforced polymer laminate, fiber-reinforced polymerlaminate with filler particles.

According to an embodiment, chip arrangement further includes anelectrically conductive plating layer formed over the one or more secondelectrically conductive portions.

Various embodiments provide a method for forming a chip arrangement, themethod including: electrically connecting a first chip to a first chipcarrier top side, wherein the first chip carrier includes a first chipcarrier top side and a first chip carrier bottom side; electricallyconnecting a second chip to a second chip carrier top side, wherein thesecond chip carrier includes a second chip carrier top side and a secondchip carrier bottom side; at least partially surrounding the first chipcarrier and the second chip carrier with an electrically insulatingmaterial; forming at least one electrical interconnect to electricallycontact the first chip to the second chip through the electricallyinsulating material; forming one or more first electrically conductiveportions and one or more second electrically conductive portions overthe electrically insulating material, wherein forming one or more firstelectrically conductive portions and one or more second electricallyconductive portions over the electrically insulating material includesforming the one or more first electrically conductive portions over andelectrically contacting the one or more first electrically conductiveportions to at least one of the first chip carrier top side and secondchip carrier top side, and forming the one or more second electricallyconductive portions over and electrically contacting the one or morefirst electrically conductive portions to at least one of the first chipcarrier bottom side and second chip carrier bottom side.

According to an embodiment, the method further includes disposing athird chip and electrically insulating the third chip from the firstchip carrier, and electrically connecting the third chip to the firstchip via at least one further electrical interconnect; and furtherforming at least one other further electrical interconnect toelectrically contact the third chip to the second chip through theelectrically insulating material.

According to an embodiment, the method further includes forming one ormore first electrically conductive portions and one or more secondelectrically conductive portions includes forming one or more firstelectrically conductive portions and one or more second electricallyconductive portions by galvanic deposition; and depositing anelectrically conductive plating layer over the one or more secondelectrically conductive portions.

While the invention has been particularly shown and described withreference to specific embodiments, it should be understood by thoseskilled in the art that various changes in form and detail may be madetherein without departing from the spirit and scope of the invention asdefined by the appended claims. The scope of the invention is thusindicated by the appended claims and all changes which come within themeaning and range of equivalency of the claims are therefore intended tobe embraced.

What is claimed is:
 1. A chip arrangement comprising: a first chipcarrier comprising a first chip carrier top side and a first chipcarrier bottom side; a second chip carrier comprising a second chipcarrier top side and a second chip carrier bottom side; a first chipelectrically connected to the first chip carrier top side; a second chipelectrically connected to the second chip carrier top side; anelectrically insulating material configured to at least partiallysurround the first chip carrier and the second chip carrier; at leastone electrical interconnect configured to electrically contact the firstchip to the second chip through the electrically insulating material;and one or more first electrically conductive portions and one or moresecond electrically conductive portions formed over the electricallyinsulating material, wherein the one or more first electricallyconductive portions are formed over and electrically contacted to atleast one of the first chip carrier top side and second chip carrier topside, and wherein the one or more second electrically conductiveportions are formed over and electrically contacted to at least one ofthe first chip carrier bottom side and second chip carrier bottom side.2. The chip arrangement according to claim 1, wherein the first chip andthe second chip each comprises a power semiconductor chip.
 3. The chiparrangement according to claim 2, wherein the power semiconductor chipcomprises at least one power semiconductor device from the group ofpower semiconductor devices, the group consisting of: a powertransistor, a power MOS transistor, a power bipolar transistor, a powerfield effect transistor, a power insulated gate bipolar transistor, athyristor, a MOS controlled thyristors, a silicon controlled rectifier,a power schottky diode, a silicon carbide diode, a gallium nitridedevice.
 4. The chip arrangement according to claim 1, wherein the firstchip is electrically connected to the first chip carrier top side via atleast one contact pad formed over a first chip back side; and whereinthe second chip is electrically connected to the second chip carrier topside via at least one contact pad formed over a second chip back side.5. The chip arrangement according to claim 1, further comprising a thirdchip disposed over and electrically insulated from the first chipcarrier, and electrically connected to the first chip via at least onefurther electrical interconnect.
 6. The chip arrangement according toclaim 5, further comprising at least one other further electricalinterconnect configured to electrically connect the third chip to thesecond chip.
 7. The chip arrangement according to claim 5, wherein thethird chip comprises a semiconductor logic chip.
 8. The chip arrangementaccording to claim 7, wherein the semiconductor logic chip comprises atleast one semiconductor logic device from the group of semiconductorlogic devices, the group consisting of: an application specificintegrated circuit ASIC, a driver, a controller, a sensor, a memory. 9.The chip arrangement according to claim 5, wherein the third chip backside is disposed over the first chip carrier.
 10. The chip arrangementaccording to claim 5, wherein the third chip is electrically insulatedfrom the first chip carrier by an electrically insulating medium, theelectrically insulating medium comprising at least one from thefollowing group of materials, the group consisting of: an adhesive, anelectrically insulating adhesive, an epoxy, glue, a paste, an adhesivefoil, an electrically insulating organic wafer backside coating.
 11. Thechip arrangement according to claim 1, wherein the first chip carriercomprises a first lead frame carrier; and wherein the second chipcarrier comprises a second lead frame carrier.
 12. The chip arrangementaccording to claim 1, wherein at least one of the first chip carrier andthe second chip carrier comprises at least one from the following groupof materials, the group of materials consisting of: copper, nickel,iron, copper alloy, nickel alloy, iron alloy.
 13. The chip arrangementaccording to claim 1, wherein the electrically insulating material isfurther configured to at least partially surround the first chip and thesecond chip.
 14. The chip arrangement according to claim 1, wherein theelectrically insulating material is further configured to electricallyinsulate the first chip and the first chip carrier from the second chipand the second chip carrier.
 15. The chip arrangement according to claim1, wherein the electrically insulating material is formed over the firstand the second chip carrier top sides, and the first and the second chipcarrier bottom sides.
 16. The chip arrangement according to claim 1,wherein the at least one electrical interconnect is configured toelectrically contact the first chip to the second chip via the firstchip carrier.
 17. The chip arrangement according to claim 1, wherein theat least one electrical interconnect is configured to electricallyconnect one or more contact pads formed over a second chip front side tofirst chip carrier.
 18. The chip arrangement according to claim 1,wherein the at least one electrical interconnect comprises at least onefrom the following group of electrical interconnects, the groupconsisting of: wires, electrically conductive wires, bond wires, clips,electrically conductive clips, galvanically deposited interconnects. 19.The chip arrangement according to claim 1, wherein the one or more firstelectrically conductive portions are electrically contacted to andformed over at least one of a first chip front side and a second chipfront side.
 20. The chip arrangement according to claim 18, wherein theone or more first electrically conductive portions are electricallycontacted to and formed over at least one of: one or more contact padsformed over a first chip front side, and one or more contact pads formedover a second chip front side.
 21. The chip arrangement according toclaim 1, further comprising a further electrically insulating materialconfigured to at least partially surround one or more first electricallyconductive portions.
 22. The chip arrangement according to claim 21,further comprising one or more third electrically conductive portionsformed over the further electrically insulating material, wherein theone or more third electrically conductive portions are formed over andelectrically contacted to at least one of the first chip carrier topside and the second chip carrier top side.
 23. The chip arrangementaccording to claim 22, wherein the one or more third electricallyconductive portions are electrically contacted to and formed over atleast one of a first chip front side and a second chip front side. 24.The chip arrangement according to claim 22, wherein the one or morethird electrically conductive portions are electrically contacted to oneor more first electrically conductive portions through the furtherelectrically insulating material.
 25. The chip arrangement according toclaim 1, wherein the electrically insulating material comprises at leastone from the following group of materials, the group consisting of:filled or unfilled epoxy, pre-impregnated composite fibers, reinforcedfibers, laminate, a mold material, a thermoset material, a thermoplasticmaterial, filler particles, fiber-reinforced laminate, fiber-reinforcedpolymer laminate, fiber-reinforced polymer laminate with fillerparticles.
 26. The chip arrangement according to claim 1, furthercomprising an electrically conductive plating layer formed over the oneor more second electrically conductive portions.
 27. A method forforming a chip arrangement, the method comprising: electricallyconnecting a first chip to a first chip carrier top side, wherein thefirst chip carrier comprises a first chip carrier top side and a firstchip carrier bottom side; electrically connecting a second chip to asecond chip carrier top side, wherein the second chip carrier comprisesa second chip carrier top side and a second chip carrier bottom side; atleast partially surrounding the first chip carrier and the second chipcarrier with an electrically insulating material; forming at least oneelectrical interconnect to electrically contact the first chip to thesecond chip through the electrically insulating material; forming one ormore first electrically conductive portions and one or more secondelectrically conductive portions over the electrically insulatingmaterial, wherein forming one or more first electrically conductiveportions and one or more second electrically conductive portions overthe electrically insulating material comprises forming the one or morefirst electrically conductive portions over and electrically contactingthe one or more first electrically conductive portions to at least oneof the first chip carrier top side and second chip carrier top side, andforming the one or more second electrically conductive portions over andelectrically contacting the one or more first electrically conductiveportions to at least one of the first chip carrier bottom side andsecond chip carrier bottom side.
 28. The method according to claim 27,further comprising disposing a third chip and electrically insulatingthe third chip from the first chip carrier, and electrically connectingthe third chip to the first chip via at least one further electricalinterconnect; and further forming at least one other further electricalinterconnect to electrically contact the third chip to the second chipthrough the electrically insulating material.
 29. The method accordingto claim 27, further comprising forming one or more first electricallyconductive portions and one or more second electrically conductiveportions comprises forming one or more first electrically conductiveportions and one or more second electrically conductive portions bygalvanic deposition; and depositing an electrically conductive platinglayer over the one or more second electrically conductive portions.